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High Vacuum Dual Magnetron Source Magnetron Sputter Coater with Bias Cleaning
China HenanZhengzhou Tainuo Film Materials Co., Ltd.
US$29500.00 - 35600.00
MOQ1 set
Product profile
- Coating Method
- Magnetron Sputtering
- Target Power
- DC/RF
- Chamber Size
- 194*230mm
- Substrate Size
- 100mm
- Substrate Heating
- Max. 500c
- Target Size
- 2inch*2
- Power Supply
- AC 220V
- Pump Speed
- 1.1L/S
- Molecualr Pump
- 60L/S
- Chamber Material
- SS304
- Cooling
- Water Cooling
Company profile
Zhengzhou Tainuo Film Materials Co., Ltd.
郑州泰诺薄膜材料有限公司China HenanRoom 401, 4th Floor, Building 5, Zhengzhou Yida Science and Technology New City, Jinzhan Street, Zhengzhou High-tech Zone- CertifiedVerified Supplier
- Business Type: Manufacturer
- Established: 2017
- Employees: 13
- Plant Area: 100.0m²
- Avg. Response Time: ≤ 4.85h
- Certification: -
Main Products
- coating equipment
