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High Vacuum Triple Target Magnetron Sputter Coater for Thin Film Coating Process
China HenanZhengzhou Tainuo Film Materials Co., Ltd.
US$40000.00 - 41500.00
MOQ1 set
Product profile
- Coating Method
- Magnetron Sputter
- DC Power
- 500W*2
- RF Power
- 500W*1
- Chamber Size
- 300*300mm
- Substrate Size
- 150mm
- Substrate Heating
- Max. 500c
- Target Size
- 2 Inch*3
- Power Supply
- AC 220V
- Rotary Vane Pump
- 1.1L/S
- Turbo-Molecular Pump
- 600L/S
- Chamber Material
- SS304
Company profile
Zhengzhou Tainuo Film Materials Co., Ltd.
郑州泰诺薄膜材料有限公司China HenanRoom 401, 4th Floor, Building 5, Zhengzhou Yida Science and Technology New City, Jinzhan Street, Zhengzhou High-tech Zone- CertifiedVerified Supplier
- Business Type: Manufacturer
- Established: 2017
- Employees: 13
- Plant Area: 100.0m²
- Avg. Response Time: ≤ 4.85h
- Certification: -
Main Products
- coating equipment
